GGG, SGGG, and NGG are all used for substrate liquid epitaxial growth. GGG is a specialized substrate for laser thin films. In optical communication equipment groups, a large number of 1.3um and 1.5um optical isolators are required.
Product Description
Its core component is YIG or BIG thin films based on magnetic fields. GGG single crystal substrates with different tangential directions can match the lattice of these kind of philanthropic materials, ensuring the successful epitaxial growth of YIG and BIG thin films, The excellent physical and mechanical properties and chemical stability of GGG ensure the various demands for the film during the preparation process. At the same time, GGG is applied in the magnetic refrigeration industry in HeII flow and helium nitriding front stage refrigeration at temperatures below 20K.
Main features
Low optical loss (<0.1% / cm)
High thermal conductivity (7.4 Wm-1K-1)
High laser damage threshold (> 1GW / cm2)
Typical applications
Substrate materials for YIG and BIG magneto-optical epitaxial films
Magnetic bubble memory
Magnetic refrigeration
Materials Properties
Material | GGG | SGGG |
Molecular formula | Gd3Ga5O12 | Substituted Gd3Ga5O12 |
Crystal structure | cubic system | cubic system |
Lattice constant | a=12.383 Å | a=12.497 Å |
Growing directions | Czochralski | Czochralski |
Hardness | 8.0 | 7.5 |
Density | 7.13g/cm3 | 7.09g/cm3 |
Melting point | 1725℃ | 1730℃ |
Reflection coefficient | 1.954 @ 1064nm | 1.954 @ 1064nm |
Product Parameter
Crystal orientation | <111>±0.2° |
Size | 10 * 10 * 0.5,2 inch / 3 in |
Thickness | 0.5mm, or to be customized |
Polishing | Single or double-sided |
Positioning edge accuracy | <2° |
Surface roughness | Ra≤1nm, EPI ready |